HOME > 論文 > 書誌詳細Plasma etching of TEM samples for observing grain boundaries in silicon nitride末松久幸, BANDO, Yoshio, 三友護. J.Electron Microscopy 159. 1995.NIMS著者板東 義雄Materials Data Repository (MDR)上の本文・データセット作成時刻: 2022-09-05 10:44:11 +0900 更新時刻: 2022-09-05 10:44:11 +0900
