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Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
(Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multi-layer charge trap capacitors)

Toshihide Nabatame, Akihiko Ohi, Kazuhiro Ito, Makoto Takahashi, Toyohiro Chikyo.

NIMS著者


    Materials Data Repository (MDR)上の本文・データセット


      作成時刻: 2016-05-24 17:34:28 +0900更新時刻: 2024-03-31 14:05:03 +0900

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