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Electrical properties of anatase TiO2 films by atomic layer deposition and low annealing temperature
(Electrical properties of anatase TiO2 films by atomic layer deposition and low annealing temperature)

Toshihide Nabatame, Akihiko Ohi, Toyohiro Chikyo, Masayuki Kimura, Hiroyuki Yamada, Tomoji Ohishi.
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 32 [3] 03D121. 2014.
https://doi.org/10.1116/1.4869059

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      Created at: 2016-05-24 17:13:53 +0900Updated at: 2024-05-01 06:04:27 +0900

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