HOME > 論文 > 書誌詳細Plasma Density Dependence of Oxidation Rate of Si by In Situ during Process Rapid Ellipsometry.M. Kitajima, 中村一隆, 新野仁, 黒木博, 河辺隆也, H. Kuroki, H. Shinno, K. G. Nakamura, T. Kawabe. Journal of Applied Physics 71 [10] 5278-5280. 1992.https://doi.org/10.1063/1.350541 NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 11:33:13 +0900更新時刻: 2024-04-01 20:25:15 +0900
