HOME > Article > DetailSelf-formed copper oxide contact interlayer for high-performance oxide thin film transistorsXu Gao, Shinya Aikawa, Nobuhiko Mitoma, Meng-Fang Lin, Takio Kizu, Toshihide Nabatame, Kazuhito Tsukagoshi. Applied Physics Letters 105 [2] 023503. 2014.https://doi.org/10.1063/1.4890312 NIMS author(s)Fulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 17:31:56 +0900Updated at: 2024-11-07 07:00:07 +0900
