The postspinel phase boundary in Mg2SiO4 determined by in situ X-ray diffraction

Tetsuo Irifune; Norimasa Nishiyama; Koji Kuroda; Toru Inoue; Maiko Isshiki; Wataru Utsumi; Ken-ichi Funakoshi; Satoru Urakawa; Takeyuki Uchida; Tomoo Katsura; Osamu Ohtaka; Tetsuo Irifune; Norimasa Nishiyama; Koji Kuroda; Toru Inoue; Maiko Isshiki; Wataru Utsumi; Ken-ichi Funakoshi; Satoru Urakawa; Takeyuki Uchida; Tomoo Katsura; Osamu Ohtaka

doi:10.1126/science.279.5357.1698

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The Postspinel Phase Boundary in Mg ₂ SiO ₄ Determined by in Situ X-ray Diffraction
(The postspinel phase boundary in Mg2SiO4 determined by in situ X-ray diffraction)

Tetsuo Irifune, Norimasa Nishiyama, Koji Kuroda, Toru Inoue, Maiko Isshiki, Wataru Utsumi, Ken-ichi Funakoshi, Satoru Urakawa, Takeyuki Uchida, Tomoo Katsura, Osamu Ohtaka.

Science 279 [5357] 1698-1700. 1998.

https://doi.org/10.1126/science.279.5357.1698

NIMS著者

西山宣正

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2025-10-09 16:29:36 +0900 更新時刻: 2026-09-21 04:33:12 +0900

The Postspinel Phase Boundary in Mg 2 SiO 4 Determined by in Situ X-ray Diffraction(The postspinel phase boundary in Mg2SiO4 determined by in situ X-ray diffraction)

NIMS著者

Materials Data Repository (MDR)上の本文・データセット

The Postspinel Phase Boundary in Mg ₂ SiO ₄ Determined by in Situ X-ray Diffraction
(The postspinel phase boundary in Mg2SiO4 determined by in situ X-ray diffraction)