HOME > 論文 > 書誌詳細Effect of deposition temperature on the characteristics of hafnium oxide films deposited by metalorganic chemical vapor depositiKenji Takahashi, Hiroshi Funakubo, Shiro Hino, Makoto Nakayama, Naoki Ohashi, Takanori Kiguchi, Eisuke Tokumitsu. Journal of Materials Research 19 [02] 584-589. 2004.https://doi.org/10.1557/jmr.2004.19.2.584 NIMS著者大橋 直樹Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 12:02:43 +0900更新時刻: 2024-05-02 07:15:39 +0900
