Effect of deposition temperature on the characteristics of hafnium oxide films deposited by metalorganic chemical vapor depositi | SAMURAI, NIMS Researchers Directory Service

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Effect of deposition temperature on the characteristics of hafnium oxide films deposited by metalorganic chemical vapor depositi

Kenji Takahashi, Hiroshi Funakubo, Shiro Hino, Makoto Nakayama, Naoki Ohashi, Takanori Kiguchi, Eisuke Tokumitsu.

Journal of Materials Research 19 [02] 584-589. 2004.

https://doi.org/10.1557/jmr.2004.19.2.584

NIMS author(s)

OHASHI, Naoki

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2016-05-24 12:02:43 +0900 Updated at: 2026-10-01 05:16:29 +0900

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