From Mechanics to Electronics: Influence of ALD Interlayers on the Multiaxial Electro‐Mechanical Behavior of Metal–Oxide Bilayers

Johanna Byloff; Vivek Devulapalli; Daniele Casari; Thomas E. J. Edwards; Claus O. W. Trost; Megan J. Cordill; Shuhel Altaf Husain; Pierre‐Olivier Renault; Damien Faurie; Barbara Putz; Johanna Byloff; Vivek Devulapalli; Daniele Casari; Thomas E. J. Edwards; Claus O. W. Trost; Megan J. Cordill; Shuhel Altaf Husain; Pierre‐Olivier Renault; Damien Faurie; Barbara Putz

doi:10.1002/adfm.202526343

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From Mechanics to Electronics: Influence of ALD Interlayers on the Multiaxial Electro‐Mechanical Behavior of Metal–Oxide Bilayers

Johanna Byloff, Vivek Devulapalli, Daniele Casari, Thomas E. J. Edwards, Claus O. W. Trost, Megan J. Cordill, Shuhel Altaf Husain, Pierre‐Olivier Renault, Damien Faurie, Barbara Putz.

Advanced Functional Materials 36 [27] e26343. 2026.

https://doi.org/10.1002/adfm.202526343

Open Access Wiley (Publisher) Materials Data Repository (MDR)

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作成時刻: 2026-04-16 03:05:41 +0900 更新時刻: 2026-09-22 04:30:29 +0900