HOME > 論文 > 書誌詳細Deep Dry Etching of Borosilicate Glass using Fluorine-based High-density plasmas for Microelectromechanical System FabricationTakanori Ichiki, Yoshinari Sugiyama, Takekazu Ujiie, Yasuhiro Horiike. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 21 [5] 2188. 2003.https://doi.org/10.1116/1.1612935 NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 12:02:26 +0900 更新時刻: 2026-11-02 05:07:38 +0900
