Temperature dependent Al-induced crystallization of amorphous Ge thin films on SiO2 substrates
(SiO2基板上へのアモルファスGe薄膜形成のAl誘起結晶化時の温度依存性)
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Created at: 2016-05-24 17:01:38 +0900Updated at: 2024-05-01 07:28:09 +0900