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Simultaneous Growth of Rhombochedral and Amorphous Boron Films in a Low Pressure B2H6+H2+He plasma

小松正二郎, 守吉佑介.

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    Fulltext and dataset(s) on Materials Data Repository (MDR)


      Created at: 2022-09-05 10:29:31 +0900 Updated at: 2022-09-05 10:29:31 +0900

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