Formation of 2H-Type SiC Films by Reactive Sputtering | SAMURAI, NIMS Researchers Directory Service

Scheduled downtime (October 31st and November 1st, 2026) (2026-10-29)

HOME > Article > Detail

Formation of 2H-Type SiC Films by Reactive Sputtering

松本精一郎, 鈴木弘茂, 上田隆三.

Jap.J.Appl.Phys. 607. 1972.

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2022-09-05 10:18:16 +0900 Updated at: 2022-09-05 10:18:16 +0900

▲ Go to the top of this page