Substrate-Mediated C&#8211;C and C&#8211;H Coupling after Dehalogenation

Huihui Kong; Sha Yang; Hongying Gao; Alexander Timmer; Jonathan P. Hill; Oscar Díaz Arado; Harry Mönig; Xinyan Huang; Qin Tang; Qingmin Ji; Wei Liu; Harald Fuchs

doi:10.1021/jacs.6b10936

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Substrate-Mediated C–C and C–H Coupling after Dehalogenation
(Substrate-Mediated C–C and C–H Coupling after Dehalogenation)

Huihui Kong, Sha Yang, Hongying Gao, Alexander Timmer, Jonathan P. Hill, Oscar Díaz Arado, Harry Mönig, Xinyan Huang, Qin Tang, Qingmin Ji, Wei Liu, Harald Fuchs.

Journal of the American Chemical Society 139 [10] 3669-3675. 2017.

https://doi.org/10.1021/jacs.6b10936

NIMS著者

ヒルジョナサン

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2017-05-08 19:23:54 +0900更新時刻: 2024-04-01 23:44:12 +0900

Substrate-Mediated C–C and C–H Coupling after Dehalogenation(Substrate-Mediated C–C and C–H Coupling after Dehalogenation)

NIMS著者

Materials Data Repository (MDR)上の本文・データセット

Substrate-Mediated C–C and C–H Coupling after Dehalogenation
(Substrate-Mediated C–C and C–H Coupling after Dehalogenation)