Molecular dynamics study of Si(100)-oxidation: SiO and Si emissions from Si/SiO<sub>2</sub> interfaces and their incorporation into SiO<sub>2</sub> | SAMURAI, NIMS Researchers Directory Service

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Molecular dynamics study of Si(100)-oxidation: SiO and Si emissions from Si/SiO₂ interfaces and their incorporation into SiO₂
(Si(100)酸化の分子動力学研究：Si/SiO2界面からのSiOおよびSiの放出およびそれらのSiO2への取り込み)

Norihiko Takahashi, Takahiro Yamasaki, Chioko Kaneta.

Journal of Applied Physics 115 [22] 224303. 2014.

https://doi.org/10.1063/1.4876911

NIMS author(s)

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Created at: 2016-05-24 17:41:11 +0900 Updated at: 2026-10-30 07:53:38 +0900

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