Site-Specific Evolution of Surface Stress during the Room-Temperature Oxidation of the<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>Si</mml:mi><mml:mo stretchy="false">(</mml:mo><mml:mn>111</mml:mn><mml:mo stretchy="false">)</mml:mo><mml:mtext mathvariant="normal">−</mml:mtext><mml:mo stretchy="false">(</mml:mo><mml:mn>7</mml:mn><mml:mo>×</mml:mo><mml:mn>7</mml:mn><mml:mo stretchy="false">)</mml:mo></mml:math>Surface | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Site-Specific Evolution of Surface Stress during the Room-Temperature Oxidation of theSi(111)−(7×7)Surface
(Site-Specific Evolution of Surface Stress during the Room-Temperature Oxidation of theSi(111)−(7×7)Surface)

N. T. Kinahan, D. E. Meehan, T. Narushima, S. Sachert, J. J. Boland, K. Miki.

Physical Review Letters 104 [14] 146101. 2010.

https://doi.org/10.1103/physrevlett.104.146101

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作成時刻: 2016-05-24 16:03:17 +0900 更新時刻: 2026-10-08 07:35:01 +0900

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