Rearrangement of ferroelectric domain structure induced by chemical etching
(化学エッチングによる強誘電体分域構造の再配列)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2016-05-24 14:48:28 +0900Updated at: 2024-04-30 05:14:40 +0900