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Rearrangement of ferroelectric domain structure induced by chemical etching
(化学エッチングによる強誘電体分域構造の再配列)

M. Kitamura, S. Iwamoto, Y. Arakawa.
Applied Physics Letters 87 [15] 151119. 2005.
https://doi.org/10.1063/1.1993769

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