HOME > プロフィール > 弓削 雅津也
出版物原則として、2004年以降のNIMS所属における研究成果や出版物を表示しています。
論文
- Masafumi Hirose, Toshihide Nabatame, Kazuya Yuge, Erika Maeda, Akihiko Ohi, Naoki Ikeda, Yoshihiro Irokawa, Hideo Iwai, Hideyuki Yasufuku, Satoshi Kawada, Makoto Takahashi, Kazuhiro Ito, Yasuo Koide, Hajime Kiyono. Influence of post-deposition annealing on characteristics of Pt/Al2O3/β-Ga2O3 MOS capacitors. Microelectronic Engineering. 216 (2019) 111040 10.1016/j.mee.2019.111040
- Yoshihiro Irokawa, Toshihide Nabatame, Kazuya Yuge, Akira Uedono, Akihiko Ohi, Naoki Ikeda, Yasuo Koide. Investigation of Al2O3/GaN interface properties by sub-bandgap photo-assisted capacitance-voltage technique. AIP Advances. 9 [8] (2019) 085319 10.1063/1.5098489
- Kazuya Yuge, Toshihide Nabatame, Yoshihiro Irokawa, Akihiko Ohi, Naoki Ikeda, Liwen Sang, Yasuo Koide, Tomoji Ohishi. Characteristics of Al2O3/native oxide/n-GaN capacitors by post-metallization annealing. Semiconductor Science and Technology. 34 [3] (2019) 034001 10.1088/1361-6641/aafdbd
口頭発表
- HIROSE, Masafumi, NABATAME, Toshihide, YUGE, Kazuya, MAEDA, Erika, OHI, Akihiko, IKEDA, Naoki, IROKAWA, Yoshihiro, IWAI, Hideo, 安福 秀幸, KAWADA, Satoshi, KOIDE, Yasuo. Influence of post-deposition annealing on electrical characteristics of Pt/Al2O3/β-Ga2O3 MOS capacitors. INFOS 2019. 2019
- MAEDA, Erika, NABATAME, Toshihide, HIROSE, Masafumi, INOUE, Mari, YUGE, Kazuya, OHI, Akihiko, 清野肇, IKEDA, Naoki, 塩崎宏司. Change of characteristics for n-GaN MOS capacitors with Hf-rich HfSiOx gate dielectrics by various post-deposition annealing. INFOS 2019. 2019
- YUGE, Kazuya, NABATAME, Toshihide, IROKAWA, Yoshihiro, OHI, Akihiko, IKEDA, Naoki, 上殿 明良, SANG, Liwen, KOIDE, Yasuo, 大石 知司. Influence of post-deposition annealing on interface characteristics at Al2O3/n-GaN. Electron Devices Technology and Manufacturing Conference. 2019
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