HOME > Profile > ONAYA, Takashi
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- Address
- 305-0044 1-1 Namiki Tsukuba Ibaraki JAPAN [Access]
Research
PublicationsNIMS affiliated publications since 2004.
Research papers
- Takashi Onaya, Koji Kita. (Invited) Role of Oxidant Gas for Atomic Layer Deposition of HfxZr1−XO2 Thin Films on Ferroelectricity of Metal-Ferroelectric-Metal Capacitors. ECS Transactions. 113 [2] (2024) 51-59 10.1149/11302.0051ecst
- Takashi Onaya, Toshihide Nabatame, Takahiro Nagata, Kazuhito Tsukagoshi, Jiyoung Kim, Chang-Yong Nam, Esther H.R. Tsai, Koji Kita. Effects of oxidant gas for atomic layer deposition on crystal structure and fatigue of ferroelectric HfxZr1−xO2 thin films. Solid-State Electronics. 210 (2023) 108801 10.1016/j.sse.2023.108801
- Jin-Hyun Kim, Takashi Onaya, Hye Ryeon Park, Yong Chan Jung, Dan N. Le, Minjong Lee, Heber Hernandez-Arriaga, Yugang Zhang, Esther H. R. Tsai, Chang-Yong Nam, Toshihide Nabatame, Si Joon Kim, Jiyoung Kim. Toward Low-Thermal-Budget Hafnia-Based Ferroelectrics via Atomic Layer Deposition. ACS Applied Electronic Materials. 5 [9] (2023) 4726-4745 10.1021/acsaelm.3c00733
Proceedings
- Kazunori Kurishima, Toshihide Nabatame, Takashi Onaya, Kazuhito Tsukagoshi, Akihiko Ohi, Naoki Ikeda, Takahiro Nagata, Atsushi Ogura. Suppression of threshold voltage shift on In-Si-O-C Thin-Film Transistor with an Al2O3 Passivation Layer under Negative and Positive Gate-Bias Stress. Electron Devices Technology and Manufacturing Conference (EDTM). (2019) 10.1109/edtm.2019.8731167
Presentations
- 女屋 崇. 強誘電性の向上へ向けたHfO2系強誘電体薄膜と電極の界面設計の重要性. 電気学会C部門 電子材料研究会「マルチ機能デバイス実現に向けた材料、プロセス・評価技術の開拓」. 2025 Invited
- NABATAME, Toshihide, IROKAWA, Yoshihiro, SAWADA, Tomomi, 三浦 博美, 宮本 真奈美, ONAYA, Takashi, TSUKAGOSHI, Kazuhito. Improvement of electrical properties of Ga2O3/Al2O3/Pt capacitors using the ALD-dummy-SiO2 process. 38th International Microprocesses and Nanotechnology Conference (MNC 2025). 2025
- ONAYA, Takashi. Interface Engineering for Crystal Phase Control and High Fatigue Resistance in Ferroelectric HfO2-Based Thin Films. 2025 International Workshop on Dielectric Thin Films for Future Electron Devices: Science and Technology (IWDTF 2025). 2025 Invited
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