publication_type publication_year number author title journal_title volume_number issue_number start_page end_page doi reported_at
Paper 2024 1 Yoshihiro Irokawa, Akihiko Ohi, Toshihide Nabatame, Yasuo Koide ECS Journal of Solid State Science and Technology 13 4 045002 https://doi.org/10.1149/2162-8777/ad3959 2024-04-26 00:50:17 +0900
Paper 2023 1 Isao Ohkubo, Masayuki Murata, Akihiko Ohi, Mariana S. L. Lima, Takeaki Sakurai, Takashi Aizawa, Takao Mori Applied Physics Letters 122 24 https://doi.org/10.1063/5.0151494 2024-04-26 00:50:17 +0900
Paper 2022 1 大久保 勇男, 大井 暁彦, 相澤 俊, 森 孝雄, 村田正行 微細化熱電デバイスの開発 クリーンエネルギー 31 11 15 19 2024-04-26 00:50:17 +0900
Paper 2022 2 Isao Ohkubo, Masayuki Murata, Mariana S.L. Lima, Takeaki Sakurai, Yuko Sugai, Akihiko Ohi, Takashi Aizawa, Takao Mori Materials Today Energy 28 101075 https://doi.org/10.1016/j.mtener.2022.101075 2024-04-26 00:50:17 +0900
Paper 2021 1 Toshihide Nabatame, Erika Maeda, Mari Inoue, Masafumi Hirose, Yoshihiro Irokawa, Akihiko Ohi, Naoki Ikeda, Takashi Onaya, Koji Shiozaki, Ryota Ochi, Tamotsu Hashizume, Yasuo Koide Influence of HfO2 and SiO2 interfacial layers on the characteristics of n-GaN/HfSiOx capacitors using plasma-enhanced atomic layer deposition Journal of Vacuum Science & Technology A 39 6 062405 https://doi.org/10.1116/6.0001334 2024-04-26 00:50:17 +0900
Paper 2021 2 Tomomi Sawada, Toshihide Nabatame, Takashi Onaya, Mari Inoue, Akihiko Ohi, Naoki Ikeda, Kazuhito Tsukagoshi Importance of Annealing Step on Dielectric Constant of ZrO2 Layer of MIM Capacitors with Al2O3/ZrO2 and ZrO2/Al2O3 Stack Structures ECS Transactions 121 128 https://doi.org/10.1149/10404.0121ecst 2024-04-26 00:50:17 +0900
Paper 2021 3 Riku Kobayashi, Toshihide Nabatame, Takashi Onaya, Akihiko Ohi, Naoki Ikeda, Takahiro Nagata, Kazuhito Tsukagoshi, Atsushi Ogura Influence of adsorbed oxygen concentration on characteristics of carbon-doped indium oxide thin-film transistors under bias stress Japanese Journal of Applied Physics 60 SC SCCM01 https://doi.org/10.35848/1347-4065/abe685 2024-04-26 00:50:17 +0900
Paper 2021 4 Riku Kobayashi, Toshihide Nabatame, Takashi Onaya, Akihiko Ohi, Naoki Ikeda, Takahiro Nagata, Kazuhito Tsukagoshi, Atsushi Ogura Comparison of characteristics of thin-film transistor with In2O3 and carbon-doped In2O3 channels by atomic layer deposition and post-metallization annealing in O3 Japanese Journal of Applied Physics 60 3 030903 https://doi.org/10.35848/1347-4065/abde54 2024-04-26 00:50:17 +0900
Paper 2021 5 Masafumi Hirose, Toshihide Nabatame, Yoshihiro Irokawa, Erika Maeda, Akihiko Ohi, Naoki Ikeda, Liwen Sang, Yasuo Koide, Hajime Kiyono Interface characteristics of β-Ga2O3/Al2O3/Pt capacitors after postmetallization annealing Journal of Vacuum Science & Technology A 39 1 012401 https://doi.org/10.1116/6.0000626 2024-04-26 00:50:17 +0900
Paper 2020 1 Erika Maeda, Toshihide Nabatame, Masafumi Hirose, Mari Inoue, Akihiko Ohi, Naoki Ikeda, Hajime Kiyono Correlation between SiO2 growth rate and difference in electronegativity of metal–oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor Journal of Vacuum Science & Technology A 38 3 032409 https://doi.org/10.1116/6.0000078 2024-04-26 00:50:17 +0900
Paper 2020 2 Hai Dang Ngo, Kai Chen, Ørjan S. Handegård, Anh Tung Doan, Thien Duc Ngo, Thang Duy Dao, Naoki Ikeda, Akihiko Ohi, Toshihide Nabatame, Tadaaki Nagao Nanoantenna Structure with Mid-Infrared Plasmonic Niobium-Doped Titanium Oxide Micromachines 11 1 23 https://doi.org/10.3390/mi11010023 2024-04-26 00:50:17 +0900
Paper 2019 1 Yoshihiro Irokawa, Toshihide Nabatame, Akihiko Ohi, Naoki Ikeda, Osami Sakata, Yasuo Koide Hydrogen effect on Pt/Al2O3/GaN metal-oxide-semiconductor capacitors Japanese Journal of Applied Physics 58 10 100915 https://doi.org/10.7567/1347-4065/ab476a 2024-04-26 00:50:17 +0900
Paper 2019 2 Thang Duy Dao, Satoshi Ishii, Anh Tung Doan, Yoshiki Wada, Akihiko Ohi, Toshihide Nabatame, Tadaaki Nagao On-Chip Quad-Wavelength Pyroelectric Sensor for Spectroscopic Infrared Sensing Advanced Science 6 20 1900579 https://doi.org/10.1002/advs.201900579 2024-04-26 00:50:17 +0900
Paper 2019 3 Masafumi Hirose, Toshihide Nabatame, Kazuya Yuge, Erika Maeda, Akihiko Ohi, Naoki Ikeda, Yoshihiro Irokawa, Hideo Iwai, Hideyuki Yasufuku, Satoshi Kawada, Makoto Takahashi, Kazuhiro Ito, Yasuo Koide, Hajime Kiyono Influence of post-deposition annealing on characteristics of Pt/Al2O3/β-Ga2O3 MOS capacitors Microelectronic Engineering 216 111040 https://doi.org/10.1016/j.mee.2019.111040 2024-04-26 00:50:17 +0900
Paper 2019 4 Yoshihiro Irokawa, Toshihide Nabatame, Kazuya Yuge, Akira Uedono, Akihiko Ohi, Naoki Ikeda, Yasuo Koide Investigation of Al2O3/GaN interface properties by sub-bandgap photo-assisted capacitance-voltage technique AIP Advances 9 8 085319 https://doi.org/10.1063/1.5098489 2024-04-26 00:50:17 +0900
Paper 2019 5 Erika Maeda, Toshihide Nabatame, Kazuya Yuge, Masafumi Hirose, Mari Inoue, Akihiko Ohi, Naoki Ikeda, Koji Shiozaki, Hajime Kiyono Change of characteristics of n-GaN MOS capacitors with Hf-rich HfSiOx gate dielectrics by post-deposition annealing Microelectronic Engineering 216 111036 https://doi.org/10.1016/j.mee.2019.111036 2024-04-26 00:50:17 +0900
Paper 2019 6 Thang Duy Dao, Chung Vu Hoang, Natsuki Nishio, Naoki Yamamoto, Akihiko Ohi, Toshihide Nabatame, Masakazu Aono, Tadaaki Nagao Dark-Field Scattering and Local SERS Mapping from Plasmonic Aluminum Bowtie Antenna Array Micromachines 10 7 468 https://doi.org/10.3390/mi10070468 2024-04-26 00:50:17 +0900
Paper 2019 7 Riku Kobayashi, Toshihide Nabatame, Kazunori Kurishima, Takashi Onaya, Akihiko Ohi, Naoki Ikeda, Takahiro Nagata, Kazuhito Tsukagoshi, Atsushi Ogura Characteristics of Oxide TFT Using Carbon-Doped Ιn2O3 Thin Film Fabricated by Low-Temperature ALD Using Ethylcyclopentadienyl Indium (Ιn-EtCp) and H2O & O3 ECS Transactions 92 3 3 13 https://doi.org/10.1149/09203.0003ecst 2024-04-26 00:50:17 +0900
Paper 2019 8 Toshihide Nabatame, Ippei Yamamoto, Tomomi Sawada, Akihiko Ohi, Thang Duy Dao, Tomoji Ohishi, Tadaaki Nagao Change of Electrical Properties of Rutile- and Anatase-TiO2 Films By Atomic Layer Deposited Al2O3 ECS Transactions 92 3 15 21 https://doi.org/10.1149/09203.0015ecst 2024-04-26 00:50:17 +0900
Paper 2019 9 Takashi Onaya, Toshihide Nabatame, Naomi Sawamoto, Akihiko Ohi, Naoki Ikeda, Takahiro Nagata, Atsushi Ogura Ferroelectricity of HfxZr1−xO2 thin films fabricated by 300 °C low temperature process with plasma-enhanced atomic layer deposition Microelectronic Engineering 215 111013 https://doi.org/10.1016/j.mee.2019.111013 2024-04-26 00:50:17 +0900
Paper 2019 10 Anh Tung Doan, Takahiro Yokoyama, Thang Duy Dao, Satoshi Ishii, Akihiko Ohi, Toshihide Nabatame, Yoshiki Wada, Shigenao Maruyama, Tadaaki Nagao A MEMS-based Quad-wavelength Hybrid Plasmonic–pyroelectric Infrared Detector Micromachines 10 6 413 https://doi.org/10.3390/mi10060413 2024-04-26 00:50:17 +0900
Paper 2019 11 Thang Duy Dao, Anh Tung Doan, Satoshi Ishii, Takahiro Yokoyama, Handegård Sele Ørjan, Dang Hai Ngo, Tomoko Ohki, Akihiko Ohi, Yoshiki Wada, Chisato Niikura, Shinsuke Miyajima, Toshihide Nabatame, Tadaaki Nagao MEMS-Based Wavelength-Selective Bolometers Micromachines 10 6 416 https://doi.org/10.3390/mi10060416 2024-04-26 00:50:17 +0900
Paper 2019 12 Takashi Onaya, Toshihide Nabatame, Naomi Sawamoto, Akihiko Ohi, Naoki Ikeda, Takahiro Nagata, Atsushi Ogura Improvement in ferroelectricity of HfxZr1−xO2 thin films using top- and bottom-ZrO2 nucleation layers APL Materials 7 6 061107 https://doi.org/10.1063/1.5096626 2024-04-26 00:50:17 +0900
Paper 2019 13 Ahmed A.M. El-Amir, Takeo Ohsawa, Toshihide Nabatame, Akihiko Ohi, Yoshiki Wada, Masaru Nakamura, Xiuwei Fu, Kiyoshi Shimamura, Naoki Ohashi Ecofriendly Mg2Si-based photodiode for short-wavelength IR sensing Materials Science in Semiconductor Processing 91 222 229 https://doi.org/10.1016/j.mssp.2018.11.033 2024-04-26 00:50:17 +0900
Paper 2019 14 Kazuya Yuge, Toshihide Nabatame, Yoshihiro Irokawa, Akihiko Ohi, Naoki Ikeda, Liwen Sang, Yasuo Koide, Tomoji Ohishi Characteristics of Al2O3/native oxide/n-GaN capacitors by post-metallization annealing Semiconductor Science and Technology 34 3 034001 https://doi.org/10.1088/1361-6641/aafdbd 2024-04-26 00:50:17 +0900
Paper 2019 15 Toshihide Nabatame, Erika Maeda, Mari Inoue, Kazuya Yuge, Masafumi Hirose, Koji Shiozaki, Naoki Ikeda, Tomoji Ohishi, Akihiko Ohi Hafnium silicate gate dielectrics in GaN metal oxide semiconductor capacitors Applied Physics Express 12 1 011009 https://doi.org/10.7567/1882-0786/aaf62a 2024-04-26 00:50:17 +0900
Paper 2018 1 Norifusa Satoh, Masaji Otsuka, Tomoko Ohki, Akihiko Ohi, Yasuaki Sakurai, Yukihiko Yamashita, Takao Mori フォトリソグラフィック枠で支持された有機π型熱電モジュール：粘性熱電材料の作業仮説 Science and Technology of Advanced Materials 19 1 517 525 https://doi.org/10.1080/14686996.2018.1487239 2024-04-26 00:50:17 +0900
Paper 2018 2 Yoshihiro Irokawa, Kazutaka Mitsuishi, Taku T. Suzuki, Kazuya Yuge, Akihiko Ohi, Toshihide Nabatame, Tsuyoshi Ohnishi, Koji Kimoto, Yasuo Koide Electron microscopy and ultraviolet photoemission spectroscopy studies of native oxides on GaN(0001) Japanese Journal of Applied Physics 57 9 098003 https://doi.org/10.7567/jjap.57.098003 2024-04-26 00:50:17 +0900
Paper 2018 3 Takashi Onaya, Toshihide Nabatame, Naomi Sawamoto, Kazunori Kurishima, Akihiko Ohi, Naoki Ikeda, Takahiro Nagata, Atsushi Ogura Ferroelectricity of HfxZr1−xO2 Thin Films Fabricated Using TiN Stressor and ZrO2 Nucleation Techniques ECS Transactions 86 6 31 38 https://doi.org/10.1149/08606.0031ecst 2024-04-26 00:50:17 +0900
Paper 2018 4 Takashi Onaya, Toshihide Nabatame, Tomomi Sawada, Kazunori Kurishima, Naomi Sawamoto, Akihiko Ohi, Toyohiro Chikyow, Atsushi Ogura Improved leakage current properties of ZrO2/(Ta/Nb)Ox-Al2O3/ZrO2 nanolaminate insulating stacks for dynamic random access memory Thin Solid Films 655 48 53 https://doi.org/10.1016/j.tsf.2018.02.010 2024-04-26 00:50:17 +0900
Paper 2018 5 生田目 俊秀, 木村 将之, 弓削 雅津也, 井上万里, 池田 直樹, 大石友司, 大井 暁彦 原子層堆積法の酸化ガスがAl2O3膜の電気特性へ及ぼす影響 JOURNAL OF THE SURFACE SCIENCE SOCIETY OF JAPAN 61 5 280 285 2024-04-26 00:50:17 +0900
Paper 2018 6 Ramu Pasupathi Sugavaneshwar, Satoshi Ishii, Thang Duy Dao, Akihiko Ohi, Toshihide Nabatame, Tadaaki Nagao Fabrication of Highly Metallic TiN Films by Pulsed Laser Deposition Method for Plasmonic Applications ACS Photonics 5 3 814 819 https://doi.org/10.1021/acsphotonics.7b00942 2024-04-26 00:50:17 +0900
Paper 2017 1 Yoshihiro Irokawa, Taku T. Suzuki, Kazuya Yuge, Akihiko Ohi, Toshihide Nabatame, Koji Kimoto, Tsuyoshi Ohnishi, Kazutaka Mitsuishi, Yasuo Koide Low-energy ion scattering spectroscopy and reflection high-energy electron diffraction of native oxides on GaN(0001) Japanese Journal of Applied Physics 56 12 128004 https://doi.org/10.7567/jjap.56.128004 2024-04-26 00:50:17 +0900
Paper 2017 2 Tomomi Sawada, Toshihide Nabatame, Thang Duy Dao, Ippei Yamamoto, Kazunori Kurishima, Takashi Onaya, Akihiko Ohi, Kazuhiro Ito, Makoto Takahashi, Kazuyuki Kohama, Tomoji Ohishi, Atsushi Ogura, Tadaaki Nagao plasma-enhanced atomic layer deposition法によるRuO2下部電極の表面平滑性の改善及びRuO2/TiO2/Al2O3/TiO2/RuO2キャパシタの特性 Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35 6 061503 https://doi.org/10.1116/1.4998425 2024-04-26 00:50:17 +0900
Paper 2017 3 Takashi Onaya, Toshihide Nabatame, Naomi Sawamoto, Akihiko Ohi, Naoki Ikeda, Toyohiro Chikyow, Atsushi Ogura Improvement in ferroelectricity of HfxZr1-xO2 thin film using ZrO2 seed layer Applied Physics Express 10 8 081501 https://doi.org/10.7567/apex.10.081501 2024-04-26 00:50:17 +0900
Paper 2016 1 Kexiong Zhang, Meiyong Liao, Masataka Imura, Toshihide Nabatame, Akihiko Ohi, Masatomo Sumiya, Yasuo Koide, Liwen Sang Electrical hysteresis in p-GaN metal–oxide–semiconductor capacitor with atomic-layer-deposited Al2O3 as gate dielectric Applied Physics Express 9 12 121002 https://doi.org/10.7567/apex.9.121002 2024-04-26 00:50:17 +0900
Paper 2016 2 Tung S. Bui, Thang D. Dao, Luu H. Dang, Lam D. Vu, Akihiko Ohi, Toshihide Nabatame, YoungPak Lee, Tadaaki Nagao, Chung V. Hoang Metamaterial-enhanced vibrational absorption spectroscopy for the detection of protein molecules Scientific Reports 6 1 https://doi.org/10.1038/srep32123 2024-04-26 00:50:17 +0900
Paper 2015 1 Kazunori Kurishima, Toshihide Nabatame, Maki Shimizu, Nobuhiko Mitoma, Takio Kizu, Shinya Aikawa, Kazuhito Tsukagoshi, Akihiko Ohi, Toyohiro Chikyow, Atsushi Ogura Ga-In-Zn-O薄膜トランジスタにAl2O3層を形成した電気特性への影響 Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 33 6 061506 https://doi.org/10.1116/1.4928763 2024-04-26 00:50:17 +0900
Paper 2015 2 Thang Duy Dao, Kai Chen, Satoshi Ishii, Akihiko Ohi, Toshihide Nabatame, Masahiro Kitajima, Tadaaki Nagao Infrared Perfect Absorbers Fabricated by Colloidal Mask Etching of Al–Al2O3–Al Trilayers ACS Photonics 2 7 964 970 https://doi.org/10.1021/acsphotonics.5b00195 2024-04-26 00:50:17 +0900
Paper 2015 3 Shimaa A. Abdellatef, Riho Tange, Takeshi Sato, Akihiko Ohi, Toshihide Nabatame, Akiyoshi Taniguchi Nanostructures control the hepatocellular responses to a cytotoxic agent “cisplatin” BioMed Research International 2015 1 10 https://doi.org/10.1155/2015/925319 2024-04-26 00:50:17 +0900
Paper 2015 4 Toshihide Nabatame, Akihiko Ohi, Kazuhiro Ito, Makoto Takahashi, Toyohiro Chikyo Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multi-layer charge trap capacitors Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 33 1 01A118 https://doi.org/10.1116/1.4901231 2024-04-26 00:50:17 +0900
Paper 2014 1 Toshihide Nabatame, Akihiko Ohi, Toyohiro Chikyo, Masayuki Kimura, Hiroyuki Yamada, Tomoji Ohishi Electrical properties of anatase TiO2 films by atomic layer deposition and low annealing temperature Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 32 3 03D121 https://doi.org/10.1116/1.4869059 2024-04-26 00:50:17 +0900
Paper 2014 2 Shimaa Abdellatef, Akihiko Ohi, Toshihide Nabatame, Akiyoshi Taniguchi The Effect of Physical and Chemical Cues on Hepatocellular Function and Morphology International Journal of Molecular Sciences 15 3 4299 4317 https://doi.org/10.3390/ijms15034299 2024-04-26 00:50:17 +0900
Paper 2014 3 Shimaa A. Abdellatef, Akihiko Ohi, Toshihide Nabatame, Akiyoshi Taniguchi Induction of hepatocyte functional protein expression by submicron/nano-patterning substrates to mimic in vivo structures Biomater. Sci. 2 3 330 338 https://doi.org/10.1039/c3bm60191a 2024-04-26 00:50:17 +0900
Paper 2012 1 Toshihide Nabatame, Masayuki Kimura, Hiroyuki Yamada, Akihiko Ohi, Tomoji Ohishi, Toyohiro Chikyow Hfからなるhigh-k誘電体で酸素移動がフラットバンド電圧シフトへ及ぼす影響 Thin Solid Films 520 8 3387 3391 https://doi.org/10.1016/j.tsf.2011.10.086 2024-04-26 00:50:17 +0900