publication_type publication_year number author title journal_title volume_number issue_number start_page end_page doi reported_at Paper 2023 1 Yulu He, Chisato Niikura, Porponth Sichanugrist, Takeaki Sakurai, Makoto Konagai, Ashraful Islam Antireflection effect of high haze FTO for improving short circuit current density of perovskite solar cells Materials Science in Semiconductor Processing 164 107605 https://doi.org/10.1016/j.mssp.2023.107605 2025-02-19 07:40:01 +0900 Paper 2022 1 Lingying Li, Wanli Li, Xuying Liu, Mizuki Tenjimbayashi, Hiroyo Segawa, Chisato Niikura, Tomonobu Nakayama, Takeo Minari Microflow Manipulation by Velocity Field Gradient: Spontaneous Patterning of Silver Nanowires for Tailored Flexible Transparent Conductors Advanced Materials Technologies 7 8 2101687 https://doi.org/10.1002/admt.202270046 2025-02-19 07:40:01 +0900 Paper 2020 1 Chisato Niikura, Yuta Shiratori, Shinsuke Miyajima Si surface passivation by using triode-type plasma-enhanced chemical vapor deposition with thermally energized film-precursors The European Physical Journal Applied Physics 89 1 10101 https://doi.org/10.1051/epjap/2020190299 2025-02-19 07:40:01 +0900 Paper 2019 1 Thang Duy Dao, Anh Tung Doan, Satoshi Ishii, Takahiro Yokoyama, Handegård Sele Ørjan, Dang Hai Ngo, Tomoko Ohki, Akihiko Ohi, Yoshiki Wada, Chisato Niikura, Shinsuke Miyajima, Toshihide Nabatame, Tadaaki Nagao MEMS-Based Wavelength-Selective Bolometers Micromachines 10 6 416 https://doi.org/10.3390/mi10060416 2025-02-19 07:40:01 +0900 Paper 2016 1 Dong-Won Kang, Porponth Sichanugrist, Bancha Janthong, Muhammad Ajmal Khan, Chisato Niikura, Makoto Konagai カーボンソースとしてトリメチルボロンを添加する手法によるワイドバンドギャップP型a-SiOxCy:H の開発 Electronic Materials Letters 12 4 462 467 https://doi.org/10.1007/s13391-016-4007-y 2025-02-19 07:40:01 +0900 Paper 2016 2 Chisato Niikura, Amartya Chowdhury, Bancha Janthong, Porponth Sichanugrist, Makoto Konagai ソフトインプリントにより作製した3D SiOxミクロ構造周期配列基板上p-i-nスーパーストレート型高効率アモルファスSi太陽電池 Applied Physics Express 9 4 042301 https://doi.org/10.7567/apex.9.042301 2025-02-19 07:40:01 +0900 Paper 2010 1 Chisato Niikura, Akihisa Matsuda ガス流制御RFプラズマCVD法による高安定アモルファスSi膜成長 physica status solidi (a) 207 3 521 524 https://doi.org/10.1002/pssa.200982844 2025-02-19 07:40:01 +0900 Paper 2009 1 K. Morigaki, C. Niikura, H. Hikita, M. Yamaguchi プラズマCVD法により作製した微結晶Siにおける欠陥 Journal of Applied Physics 105 8 083703 https://doi.org/10.1063/1.3095507 2025-02-19 07:40:01 +0900 Paper 2008 1 NIIKURA, Chisato, Romain Brenot, Joelle Guillet, Jean-Eric Bourée HWCVD法によりシランの水素希釈率を変化させて作製した微結晶シリコン膜におけるキャリア輸送特性の向上 THIN SOLID FILMS 568 571 2025-02-19 07:40:01 +0900 Paper 2007 1 Chisato Niikura, Naho Itagaki, Akihisa Matsuda SiH4/H2 グロー放電プラズマによる高品質微結晶シリコン高速作製指針 Japanese Journal of Applied Physics 46 5A 3052 3058 https://doi.org/10.1143/jjap.46.3052 2025-02-19 07:40:01 +0900 Paper 2007 2 NIIKURA, Chisato, 板垣奈穂, 松田彰久 HIGH-RATE GROWTH OF HIGH-QUALITY MICROCRYSTALLINE SILICON FILMS FROM PLASMA BY INTERCONNECTED MULTI-HOLLOW CATHODE SURFACE & COATINGS TECHNOLOGY 5463 5467 2025-02-19 07:40:01 +0900 Paper 2005 1 K. Morigaki, C. Niikura The g-values of defects in hydrogenated microcrystalline silicon Solid State Communications 136 5 308 312 https://doi.org/10.1016/j.ssc.2005.08.001 2025-02-19 07:40:01 +0900