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Doping of Ga2O3bulk crystals and NWs by ion implantation

Author(s)K. Lorenz, M. Peres, M. Felizardo, J. G. Correia, L. C. Alves, E. Alves, I. López, E. Nogales, B. Méndez, J. Piqueras, M. B. Barbosa, J. P. Araújo, J. N. Gonçalves, J. Rodrigues, L. Rino, T. Monteiro, E. G. Villora, K. Shimamura.
Proceedings titleProc. of SPIE Oxide-based Materials and Devices V
Year of publication2014
LanguageEnglish
DOIhttps://doi.org/10.1117/12.2037627

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