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Doping of Ga2O3bulk crystals and NWs by ion implantation
Author(s) | K. Lorenz, M. Peres, M. Felizardo, J. G. Correia, L. C. Alves, E. Alves, I. López, E. Nogales, B. Méndez, J. Piqueras, M. B. Barbosa, J. P. Araújo, J. N. Gonçalves, J. Rodrigues, L. Rino, T. Monteiro, E. G. Villora, K. Shimamura. |
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Proceedings title | Proc. of SPIE Oxide-based Materials and Devices V |
Year of publication | 2014 |
Language | English |
DOI | https://doi.org/10.1117/12.2037627 |