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Impact of Cation Surface Termination on the Electrical Characteristics of HfO$_{2}$/InGaAs(001) Metal–Oxide–Semiconductor Capacitors
| Author(s) | Akihiro Ohtake, Noriyuki Miyata, Yuji Urabe, Tetsuji Yasuda. |
|---|---|
| Proceedings title | JAPANESE JOURNAL OF APPLIED PHYSICS |
| Year of publication | 2011 |
| Language | English |
| DOI | https://doi.org/10.1143/jjap.50.10pd01 |