Impact of Cation Surface Termination on the Electrical Characteristics of HfO$_{2}$/InGaAs(001) Metal–Oxide–Semiconductor Capacitors
著者 | Akihiro Ohtake, Noriyuki Miyata, Yuji Urabe, Tetsuji Yasuda. |
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発表誌名 | JAPANESE JOURNAL OF APPLIED PHYSICS |
発表年 | 2011 |
言語 | English |
DOI | https://doi.org/10.1143/jjap.50.10pd01 |