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Impact of Cation Surface Termination on the Electrical Characteristics of HfO$_{2}$/InGaAs(001) Metal–Oxide–Semiconductor Capacitors

著者Akihiro Ohtake, Noriyuki Miyata, Yuji Urabe, Tetsuji Yasuda.
発表誌名JAPANESE JOURNAL OF APPLIED PHYSICS
発表年2011
言語English
DOIhttps://doi.org/10.1143/jjap.50.10pd01

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