Formation of Isotope Controlled SiC Thin Film by Plasma Chemical Vapor Deposition and its Characterization
著者 | SUZUKI, Hiroshi, ARAKI, Hiroshi, YANG, WEN, NODA, Tetsuji. |
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発表誌名 | APPLIED SURFACE SCIENCE |
発表年 | 2005 |
言語 | English |
著者 | SUZUKI, Hiroshi, ARAKI, Hiroshi, YANG, WEN, NODA, Tetsuji. |
---|---|
発表誌名 | APPLIED SURFACE SCIENCE |
発表年 | 2005 |
言語 | English |