Formation of Isotope Controlled SiC Thin Film by Plasma Chemical Vapor Deposition and its Characterization
| 著者 | SUZUKI, Hiroshi, ARAKI, Hiroshi, YANG, WEN, NODA, Tetsuji. |
|---|---|
| 発表誌名 | APPLIED SURFACE SCIENCE |
| 発表年 | 2005 |
| 言語 | English |
| 著者 | SUZUKI, Hiroshi, ARAKI, Hiroshi, YANG, WEN, NODA, Tetsuji. |
|---|---|
| 発表誌名 | APPLIED SURFACE SCIENCE |
| 発表年 | 2005 |
| 言語 | English |