HOME > Proceedings > Detail
パワーエレクトロニクス応用に向けたMOCVD法によるBi系酸化物薄膜の作製
(Preparation of Bi-based Oxide Films by MOCVD Targeting Power Electronics Applications)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-27 02:57:22 +0900Updated at: 2017-03-17 05:14:28 +0900