HOME > Proceedings > DetailFirst-Principle Molecular Model of PECVD SiOCH Film for the Mechanical and Dielectric Property InvestigationTAJIMA, Nobuo, HAMADA T, OHNO, Takahisa, 米田克己, 小林伸好, 羽坂智, 井上實. Proc. 2005 IITC, (2005) 66-68. 2005.NIMS author(s)OHNO, TakahisaFulltext and dataset(s) on Materials Data Repository (MDR)Created at :2017-02-27 00:50:21 +0900 Updated at :2017-03-17 02:50:59 +0900