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金属/酸化膜界面への化学的なデーター書き込み：低次元界面反応のI-V測定による評価
(Chemical Data Writing into Metal/oxide Interface: Characterization of Low Dimensional Interface Reactions by I-V Measurements)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-27 01:23:55 +0900Updated at: 2017-03-17 03:24:24 +0900