SAMURAI - NIMS Researchers Database

HOME > 会議録 > 詳細

Controlling Anion Composition at Metal–Insulator–Semiconductor Interfaces on III–V Channels by Plasma Processing

著者Wipakorn Jevasuwan, Yuji Urabe, Tatsuro Maeda, Noriyuki Miyata, Tetsuji Yasuda, Akihiro Ohtake, Hisashi Yamada, Masahiko Hata, Sunghoon Lee, Takuya Hoshii, Mitsuru Takenaka, Shinichi Takagi.
発表誌名JAPANESE JOURNAL OF APPLIED PHYSICS
発表年2012
言語English
DOIhttps://doi.org/10.1143/jjap.51.065701

▲ページトップへ移動