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In-situ TEM observation of silicide formation and dopant segregation in Ni fully silicided gates

Takuji Hosoi, Kentaro Shibahara, HASEGAWA, Akira, FURUYA, Kazuo.

NIMS author(s)


    Fulltext and dataset(s) on Materials Data Repository (MDR)


      Created at: 2017-02-27 01:26:00 +0900 Updated at: 2017-03-17 03:26:48 +0900

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