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Origin of Fatigue Properties Induced by Oxygen Vacancies Originating from Ferroelectric-HfxZr1−xO2/TiN Interface Reaction During Field Cycling

ONAYA, Takashi, NAGATA, Takahiro, NABATAME, Toshihide, YAMASHITA, Yoshiyuki, TSUKAGOSHI, Kazuhito, Koji Kita.
2023 International Workshop on Dielectric Thin Films For Future Electron Devices. October 23, 2023-October 25, 2023.

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Fulltext and dataset(s) on Materials Data Repository (MDR)

    Created at: 2023-10-31 03:14:38 +0900 Updated at: 2023-10-31 03:14:38 +0900

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