HOME > Presentation > DetailMetal glass application as the gate materials for the future <i>hp</i> 32-22nm node MOSFET知京 豊裕, 桜井淳平, 秦 誠一, 松本 祐司, 大毛利 健治, 柳生 進二郎, 吉武 道子, 渡部 平司, 山田 啓作, 下川邊 明. STAC-JTMC. 2007.NIMS author(s)CHIKYO, ToyohiroYAGYU, ShinjiroYOSHITAKE, MichikoFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-01-08 04:30:27 +0900Updated at: 2017-07-10 19:55:45 +0900