HOME > Presentation > Detail(Development of Laboratory Hard X-ray Photoelectron Spectroscopy system and Application to Measurement of SiO2 Thickness on Si(001))小畠 雅明, ピス イゴール, 岩井 秀夫, 山瑞拡路, 高橋宏晃, 鈴木峰晴, 野平博司, 松田博之, 大門寛, 小林 啓介. VUVX 2010. 2010.NIMS author(s)IWAI, HideoFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-01-08 04:44:15 +0900Updated at: 2017-07-10 20:47:45 +0900