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High-k 絶縁膜中の欠陥とトランジスタ特性の関係の理論的研究
(Theoretical investigations on the relationship between FET characteristics and defects in high-k gate dielectrics.)
シンポジウム「来るべきナノCMOS 時代に向けての挑戦とその課題」. 2005.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-01-08 03:49:54 +0900Updated at: 2017-07-10 19:18:17 +0900