HOME > Presentation > Detail(ias Application HX-PES Study of Metal/HfO2 structure for Oxide Based ReRAM Application)長田 貴弘, 山下 良之, 吉川 英樹, 南風盛 将光, 小林 啓介, 知京 豊裕. 8th International Nanotechnology Conference on Communication and. 2012.NIMS author(s)NAGATA, TakahiroYAMASHITA, YoshiyukiYOSHIKAWA, HidekiCHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at :2017-01-08 04:39:22 +0900 Updated at :2017-07-10 21:22:11 +0900