HOME > Presentation > Detailシリコンナノワイヤ中のP原子の熱酸化過程での偏析挙動(Segregation behavior of phosphorus atoms in silicon nanowires during thermal oxidation)神永 惇, 滝口亮, 鈴木 慶太郎, 菱田 俊一, 関口 隆史, 村上浩一, 深田 直樹. 第60回応用物理学会春季学術講演会. 2013.NIMS author(s)HISHITA, ShunichiFUKATA, NaokiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-14 11:45:21 +0900Updated at: 2017-07-10 22:22:12 +0900