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Low contact resistance on buried interfaces in oxide thin-film transistors by selective-area reduction using hydrogenation catalyst electrode
PRiME 2024. October 06, 2024-October 11, 2024. Invited
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2024-11-13 03:15:55 +0900Updated at: 2024-11-13 03:15:55 +0900