Understanding of carrier transport in MOS device with high-k gate dielectric: an electron-beam-induced current study of leakage sites
2008 International Workshop on Dielectric Thin Films (IWDTF-08). 2008.
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作成時刻: 2017-02-14 11:27:17 +0900更新時刻: 2017-07-10 20:19:20 +0900