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AuthorCHEN, Jun, SEKIGUCHI, Takashi, TAKASE, Masami, FUKATA, Naoki, CHIKYOW, Toyohiro, Ryu Hasunuma, Kikuo Yamabe, Motoyuki Sato, Yasuo Nara, Keisaku Yamada.
TitleUnderstanding of carrier transport in MOS device with high-k gate dielectric: an electron-beam-induced current study of leakage sites
Event name2008 International Workshop on Dielectric Thin Films (IWDTF-08)
Year of publication2008
LanguageEnglish
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