HOME > Presentation > Detail金属/酸化物界面結合予測式を用いたSi-およびGe/high-k界面の予測(Prediction of Si- and Ge/high-k interface bonding using general formula for predicting metal/oxide interface bonding )吉武 道子, 柳生 進二郎, 知京 豊裕. 第59回応用物理学関係連合講演会. 2012.NIMS author(s)YOSHITAKE, MichikoYAGYU, ShinjiroCHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at :2017-02-14 10:50:59 +0900 Updated at :2017-07-10 21:18:05 +0900