HOME > Presentation > DetailHfO2基強誘電体の相安定性と厚膜化(Preparation of thick HfO2 film through considering phase stability)清水 荘雄, 三村 和仙, 舟窪 浩. 第4回元素戦略シンポジウム. February 03, 2020-February 04, 2020.NIMS author(s)SHIMIZU, TakaoFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2020-08-05 03:00:18 +0900Updated at: 2020-08-05 03:00:18 +0900