HOME > Presentation > Detail(Investigation of local leakage sites in high-k/metal gate stacks by an electron-beam-induced current technique)陳 君, 関口 隆史, 深田 直樹, 佐藤基之, 高瀬 雅美, 蓮沼隆, 山部紀久夫, 山田啓作, 知京 豊裕. The 8th International Nanotechnology Conference. 2012.NIMS author(s)CHEN, JunFUKATA, NaokiCHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-14 11:29:53 +0900Updated at: 2017-07-10 21:21:28 +0900