HOME > Presentation > Detailレーザー基板加熱MOCVD法によるZnO薄膜の作製(ZnO Film Grown by MOCVD Method Equipped with the Laser Heating System)藤本 英司, 角谷 正友, リップマー ミック, 大西 剛, 渡邊 賢司, 鯉沼 秀臣. The 14th International Workshop on Oxide Electronics. 2007.NIMS author(s)SUMIYA, MasatomoWATANABE, KenjiFulltext and dataset(s) on Materials Data Repository (MDR)Created at :2017-02-14 11:43:16 +0900 Updated at :2017-07-10 20:01:36 +0900