HOME > Presentation > Detail(Bias dependent electronic states in gate stack structures: HXPES under device operation)山下 良之, 吉川 英樹, 知京 豊裕, 生田目 俊秀, 小林 啓介. International Conference on Electron Spectroscopy and Structure. 2012.NIMS author(s)YAMASHITA, YoshiyukiYOSHIKAWA, HidekiCHIKYO, ToyohiroNABATAME, ToshihideFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-01-08 05:00:38 +0900Updated at: 2017-07-10 21:27:20 +0900