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AuthorYAMAMOTO, Ippei, NABATAME, Toshihide, SAWADA, Tomomi, OHI, Akihiko, KURISHIMA, Kazunori, DAO, Duy Thang, NAGAO, Tadaaki, CHIKYOW, Toyohiro, Ogura Atsushi, Ohishi Tomoji.
TitleTMA/H2O-ALD法によるRutile-TiO2膜へ酸素欠損の形成による電気特性
(Electrical properties due to oxgen vacancy formation in Rutile-TiO2 films by TMA/H2O-ALD process)
Event name第20回ゲート・スタック研究会
Year of publication2015
LanguageJapanese
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