HOME > Presentation > Detail分子線エピタキシー法により作製したScN薄膜のSc/N比依存性(Sc/N flux ratio dependence of the ScN films prepared by molecular beam epitaxy)大垣 武, 坂口 勲, 大橋 直樹, 羽田 肇. STAC-9&TOEO-9. October 19, 2015-October 21, 2015.NIMS author(s)OGAKI, TakeshiSAKAGUCHI, IsaoOHASHI, NaokiHANEDA, HajimeFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-14 11:37:18 +0900Updated at: 2017-07-10 22:11:48 +0900