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ガス加熱トライオードプラズマCVD法によるSi表面パシベーション
(Si surface passivation by triode-type plasma-enhanced CVD with thermally-energized film-precursors)

新倉 ちさと, 宮島 晋介.
第65回応用物理学会春季学術講演会. March 17, 2018-March 20, 2018.

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    Created at: 2018-04-11 22:38:38 +0900Updated at: 2018-06-05 14:19:38 +0900

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