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Influence of surface cleaning process on initial growth of ALD-Al2O3 and electrical properties of Pt/Al2O3/β-Ga2O3 MOS capacitors

廣瀨 雅史, NABATAME, Toshihide, 前田 瑛里香, OHI, Akihiko, IKEDA, Naoki, IROKAWA, Yoshihiro, KOIDE, Yasuo, 清野肇.
ALD2019. July 21, 2019-July 24, 2019.

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Fulltext and dataset(s) on Materials Data Repository (MDR)

    Created at: 2020-03-13 03:00:31 +0900 Updated at: 2020-03-13 03:00:31 +0900

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