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Control of oxygen vacancy in TiO2 films introduced by ALD using TMA precursor

生田目 俊秀, 山本 逸平, 澤田 朋実, 大井 暁彦, ダオ デュイ タン, 長尾 忠昭, 小椋厚志, 大石知司, 知京 豊裕.
15th International Conference on Atomic Layer Deposition. June 28, 2015-July 01, 2015.

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    Created at: 2017-02-14 10:56:17 +0900Updated at: 2017-07-10 22:06:30 +0900

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