Interface stability of electrode/Bi-contained relaxor ferroelectric oxide stack struc-ture for high temperature operational capacitor
28th International Microprocesses and Nanotechnology Conference . 2015.
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Materials Data Repository (MDR)上の本文・データセット
作成時刻: 2017-02-14 10:57:12 +0900更新時刻: 2017-07-10 22:14:34 +0900